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Atomic Layer Deposition

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Atomic layer deposition
Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. ALD is considered a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals, typically called s. These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. Through the repeated exposure to separate precursors, a thin film is slowly deposited. ALD is a key process in the fabrication of semiconductor devices, and part of the set of tools available for the synthesis of nanomaterials.

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Integrated Circuit Dictionary

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Atomic Layer Deposition
a deposition technique whereby pulses of gaseous reactants are used to deposit a film one layer at a time. See tech brief on Atomic Layer Deposition.

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